SK Hynix Tests Radical New NAND Tech

As the number of layers in 3D NAND technology continues to increase, manufacturers are exploring new production techniques to enhance efficiency. SK Hynix is currently evaluating Tokyo Electron’s latest low-temperature etching equipment, which operates at temperatures as low as -70°C and is capable of producing next-generation 3D NAND with over 400 layers. This low-temperature etching equipment drills holes at three times the speed of traditional tools, proving highly effective for multi-layered 3D NAND.

According to thelec, SK Hynix is sending test wafers to Tokyo Electron’s laboratories rather than directly importing the equipment, clearly assessing the capabilities of this new technology. The current etching processes operate within a temperature range of 0°C to 30°C, making Tokyo Electron’s ability to function at -70°C particularly notable. Their published data reveals that the new etcher can perform deep etching up to 10 micrometers within 33 minutes, more than tripling the speed of existing tools. This achievement represents a significant technological advancement and substantially enhances the production efficiency of 3D NAND.

SK Hynix’s current 321-layer 3D NAND reportedly uses a triple-stack structure. With Tokyo Electron’s new equipment, it may be possible to construct 400-layer 3D NAND using either a single-stack or double-stack method, significantly increasing production efficiency. The success of this advancement will depend on the equipment’s reliability and performance consistency.

Another reason SK Hynix is considering the adoption of low-temperature etching equipment is to reduce carbon emissions. The current etching processes utilize gases like tetrafluoromethane and octafluoropropane, which have Global Warming Potentials (GWP) of 6030 and 9540, respectively. However, Tokyo Electron’s new generation of etching equipment uses hydrogen fluoride gas, which has a GWP of less than 1, thereby significantly reducing greenhouse gas emissions.

Samsung is also evaluating this new technology, differing from SK Hynix in that it has directly imported Tokyo Electron’s new equipment for testing.