Samsung promotes EUV pellicle development to catch up with TSMC faster

Samsung announced its self-developed EUV pellicle at Foundry Forum 2021. Earlier this year, it independently developed a EUV pellicle with a light transmittance of 88%. According to Samsung, the EUV pellicle should have been mass-produced, which will help it diversify and stabilize its supply chain. Of course, Samsung will not be satisfied with this, after all, 88% light transmittance is not the best similar product on the market.

According to Business Korea, a recent recruitment notice issued by Samsung Semiconductor graduate students shows that they are promoting the development of EUV pellicles with a light transmittance of 92%. At present, there are also EUV pellicles with a light transmittance of 90% or above on the market. One is ASML, and the other is S&S Tech. The latter successfully developed a EUV pellicle with a light transmittance of 90% in 2021.

It is understood that Samsung has started research on the next-generation High-NA EUV pellicle, which will be based on new materials, and Samsung will also cooperate with external institutions to develop and evaluate EUV pellicles made of carbon nanotubes and graphene. In addition, Samsung will also promote the design of a self-developed nano graphite film mass production facility.